29.045 : Semiconducting materials

ASTM E1438-06

ASTM E1438-06

Superseded Historical

Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS

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ASTM D6095-06

ASTM D6095-06

Superseded Historical

Standard Test Method for Longitudinal Measurement of Volume Resistivity for Extruded Crosslinked and Thermoplastic Semiconducting Conductor and Insulation Shielding Materials

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DIN 50451-4:2005-05

DIN 50451-4:2005-05

Superseded Historical

Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 4: Determination of 34 elements in ultra pure water by mass spectrometry with inductively coupled plasma (ICP-MS)

€56.17

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ASTM D6095-05

ASTM D6095-05

Superseded Historical

Standard Test Method for Volume Resistivity for Extruded Crosslinked and Thermoplastic Semiconducting Conductor and Insulation Shielding Materials

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DIN 50450-9:2003-04

DIN 50450-9:2003-04

Superseded Historical

Testing of materials for semiconductor technology - Determination of impurities in carrier gases and dopant gases - Part 9: Determination of oxygen, nitrogen, carbonmonoxide, carbondioxide, hydrogen and C-C-hydrocarbons in gaseous hydrogen chloride by gaschromatography

€34.30

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DIN 50451-1:2003-04

DIN 50451-1:2003-04

Withdrawn Most Recent

Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 1: Silver (Ag), gold (Au), calcium (Ca), copper (Cu), iron (Fe), potassium (K) and sodium (Na) in nitric acid by AAS

€41.78

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DIN 50451-2:2003-04

DIN 50451-2:2003-04

Withdrawn Most Recent

Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 2: Calcium (Ca), cobalt (Co), chromium (Cr), copper (Cu), Iron (Fe), nickel (Ni) and zinc (Zn) in hydrofluoric acid with plasma-induced emission spectroscopy

€41.78

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ASTM F42-02

ASTM F42-02

Withdrawn Most Recent

Standard Test Methods for Conductivity Type of Extrinsic Semiconducting Materials (Withdrawn 2003)

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ASTM F1392-02

ASTM F1392-02

Withdrawn Most Recent

Standard Test Method for Determining Net Carrier Density Profiles in Silicon Wafers by Capacitance-Voltage Measurements With a Mercury Probe (Withdrawn 2003)

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ASTM F28-02

ASTM F28-02

Withdrawn Most Recent

Standard Test Methods for Minority-Carrier Lifetime in Bulk Germanium and Silicon by Measurement of Photoconductivity Decay (Withdrawn 2003)

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ASTM F84-02

ASTM F84-02

Withdrawn Most Recent

Standard Test Method for Measuring Resistivity of Silicon Wafers With an In-Line Four-Point Probe (Withdrawn 2003)

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ASTM F374-02

ASTM F374-02

Withdrawn Most Recent

Standard Test Method for Sheet Resistance of Silicon Epitaxial, Diffused, Polysilicon, and Ion-implanted Layers Using an In-Line Four-Point Probe with the Single-Configuration Procedure (Withdrawn 2003)

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ASTM F391-02

ASTM F391-02

Withdrawn Most Recent

Standard Test Methods for Minority Carrier Diffusion Length in Extrinsic Semiconductors by Measurement of Steady-State Surface Photovoltage (Withdrawn 2003)

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ASTM F397-02

ASTM F397-02

Withdrawn Most Recent

Standard Test Method for Resistivity of Silicon Bars Using a Two-Point Probe (Withdrawn 2003)

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ASTM F523-02

ASTM F523-02

Withdrawn Most Recent

Standard Practice for Unaided Visual Inspection of Polished Silicon Wafer Surfaces (Withdrawn 2003)

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