29 : Electrical engineering

29.045 : Semiconducting materials

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ASTM F120-88

ASTM F120-88

Withdrawn Most Recent

Practices for Determination of the Concentration of Impurities in Single Crystal Semiconductor Materials by Infrared Absorption Spectroscopy (Withdrawn 1993)

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DIN 50451-5:2022-02

DIN 50451-5:2022-02

Superseded Historical

Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 5: Guideline for the selection of materials and testing of their suitability for apparatus for sampling and sample preparation for the determination of trace elements in the range of micrograms per kilogram and nanograms per kilogram

€56.17

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DIN 50451-8:2022-01

DIN 50451-8:2022-01

Superseded Historical

Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 8: Determination of 33 elements in high-purity sulfuric acid by ICP-MS

€56.17

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DIN 50450-9:2020-11

DIN 50450-9:2020-11

Superseded Historical

Testing of materials for semiconductor technology - Determination of impurities in carrier gases and dopant gases - Part 9: Determination of oxygen, nitrogen, carbonmonoxide, carbondioxide, hydrogen and C-C-hydrocarbons in gaseous hydrogen chloride by gaschromatography

€41.78

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BS IEC 62899-203:2018

BS IEC 62899-203:2018

Superseded Historical

Printed electronics Materials. Semiconductor ink

€269.00

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IEC 62899-203:2018

IEC 62899-203:2018

Superseded Historical

Printed electronics - Part 203: Materials - Semiconductor ink

€176.00

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DIN 50451-7:2017-09

DIN 50451-7:2017-09

Superseded Historical

Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 7: Determination of 31 elements in high-purity hydrochloric acid by ICP-MS

€63.27

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DIN 50451-7:2017-02

DIN 50451-7:2017-02

Superseded Historical

Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 7: Determination of 31 elements in high-purity hydrochloric acid by ICP-MS

€63.27

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ASTM F980-16

ASTM F980-16

Superseded Historical

Standard Guide for Measurement of Rapid Annealing of Neutron-Induced Displacement Damage in Silicon Semiconductor Devices

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DIN SPEC 1994:2016-07

DIN SPEC 1994:2016-07

Superseded Historical

Testing of materials for semiconductor technology - Determination of anions in weak acids

€45.05

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ASTM D6095-12(2018)

ASTM D6095-12(2018)

Superseded Historical

Standard Test Method for Longitudinal Measurement of Volume Resistivity for Extruded Crosslinked and Thermoplastic Semiconducting Conductor and Insulation Shielding Materials

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ASTM D6095-12

ASTM D6095-12

Superseded Historical

Standard Test Method for Longitudinal Measurement of Volume Resistivity for Extruded Crosslinked and Thermoplastic Semiconducting Conductor and Insulation Shielding Materials

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DIN 50451-3:2012-11

DIN 50451-3:2012-11

Superseded Historical

Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 3: Aluminium (Al), Arsenic (As), Barium (Ba), Beryllium (Be), Bismuth (Bi), Calcium (Ca), Cadmium (Cd), Cobalt (Co), Chromium (Cr), Copper (Cu), Iron (Fe), Gallium (Ga), Germanium (Ge), Hafnium (Hf), Indium (In), Potassium (K), Lithium (Li), Magnesium (Mg), Manganese (Mn), Molybdenum (Mo), Nickel (Ni), Niobium (Nb), Lead (Pb), Antimony (Sb), Tin (Sn), Strontium (Sr), Tantalum (Ta), Titanium (Ti), Vanadium (V), Zinc (Zn), Zirconium (Zr) in nitric acid by ICP-MS

€77.20

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DIN 50451-6:2012-11

DIN 50451-6:2012-11

Superseded Historical

Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 6: Determination of 36 elements in a high-purity ammonium fluoride solution (NHF) and in etching mixtures of high-purity ammonium fluoride solution containing hydrofluoric acid

€63.27

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ASTM E1438-11

ASTM E1438-11

Superseded Historical

Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS

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