29.045 : Semiconducting materials

DIN 50438-3:1999-08

DIN 50438-3:1999-08

Superseded Historical

Testing of materials for use in semiconductor technology - Determination of impurity content of silicon by infrared absorption - Part 3: Boron and phosphorus

€56.17

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DIN 50451-5:2008-09

DIN 50451-5:2008-09

Superseded Historical

Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 5: Guideline for the selection of materials and testing of their suitability for apparatus for sampling and sample preparation for the determination of trace elements in the range of micrograms per kilogram and nanograms per kilogram

€48.79

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DIN 50454-1:2000-07

DIN 50454-1:2000-07

Withdrawn Most Recent

Testing of materials for semiconductor technology - Determination of dislocations in monocrystals of III-V-compound semi-conductors - Part 1: Gallium arsenide

€56.17

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DIN 50438-3:2000-12

DIN 50438-3:2000-12

Withdrawn Most Recent

Testing of materials for use in semiconductor technology - Determination of impurity content silicon by infrared absorption - Part 3: Boron and phosphorus

€56.17

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DIN 50441-4:1999-03

DIN 50441-4:1999-03

Withdrawn Most Recent

Testing of materials for semiconductor technology - Determination of the geometric dimensions of semiconductor wafers - Part 4: Slice diameter, diamter variation, flat diameter, flat length, flat depth

€48.79

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DIN 50455-1:2008-04

DIN 50455-1:2008-04

Superseded Historical

Testing of materials for semiconductor technology - Methods for characterizing photoresists - Part 1: Determination of coating thickness with optical methods

€41.78

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DIN 50452-2:2008-04

DIN 50452-2:2008-04

Superseded Historical

Testing of materials for semiconductor technology - Test method for particle analysis in liquids - Part 2: Determination of particles by optical particle counters

€56.17

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DIN 50438-1:1978-01

DIN 50438-1:1978-01

Superseded Historical

Testing of semi-conductive inorganic materials; determination of impurity content in silicon by infrared absorption; oxygen

€34.30

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DIN 50450-2:2025-07

DIN 50450-2:2025-07

Superseded Historical

Testing of materials for semiconductor technology - Determination of impurities in carrier gases and dopant gases - Part 2: Determination of Oxygen impurities in Nitrogen, Argon, Helium, Neon and Hydrogen using a galvanic cell

€48.79

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VDI/VDE 3717 Blatt 1:1985-12

VDI/VDE 3717 Blatt 1:1985-12

Withdrawn Most Recent

Mask engineering; introduction, terms and definitions

€51.99

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VDI/VDE 3717 Blatt 2:1987-06

VDI/VDE 3717 Blatt 2:1987-06

Withdrawn Most Recent

Mask engineering; substrates

€51.99

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VDI/VDE 3717 Blatt 5:1988-02

VDI/VDE 3717 Blatt 5:1988-02

Withdrawn Most Recent

Mask engineering; blank defects

€71.85

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VDI/VDE 3717 Blatt 3:1988-04

VDI/VDE 3717 Blatt 3:1988-04

Withdrawn Most Recent

Mask engineering; layers

€51.99

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VDI/VDE 3717 Blatt 4:1989-09

VDI/VDE 3717 Blatt 4:1989-09

Superseded Historical

Mask engineering; pattern

€28.15

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VDI/VDE 3717 Blatt 6:1990-06

VDI/VDE 3717 Blatt 6:1990-06

Superseded Historical

Mask engineering; pellicles

€28.15

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