29.045 : Semiconducting materials

DIN 50449-1:1995-11

DIN 50449-1:1995-11

Superseded Historical

Testing of materials for semiconductor technology - Determination of impurity content in semiconductors by infrared absorption - Part 1: Carbon in gallium arsenide

€48.79

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DIN 50448:1995-12

DIN 50448:1995-12

Superseded Historical

Testing of materials for semiconductor technology - Contactless determination of the electrical resistivity of semi-insulating semiconductor slices using a capacitive probe

€41.78

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DIN 50440:1995-12

DIN 50440:1995-12

Superseded Historical

Testing of materials for semiconductor technology - Measurement of carrier lifetime in silicon single crystals - Recombination carrier lifetime at low injection by photoconductivity method

€48.79

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DIN 50449-2:1996-02

DIN 50449-2:1996-02

Superseded Historical

Testing of materials for semiconductor technology - Determination of impurity content in semiconductors by infrared absorption - Part 2: Boron in gallium arsenide

€34.30

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DIN 50441-2:1996-03

DIN 50441-2:1996-03

Superseded Historical

Testing of materials for semiconductor technology - Determination of the geometric dimensions of semiconductor wafers - Part 2: Testing of edge profile

€34.30

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DIN 50456-2:1995-04

DIN 50456-2:1995-04

Withdrawn Most Recent

Testing of materials for semiconductor technology - Method for the characterisation of moulding compounds for electronic components - Part 2: Determination of ionic impurities using pressure cooker test

€34.30

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DIN 50447:1995-04

DIN 50447:1995-04

Withdrawn Most Recent

Testing of materials for semiconductor technology - Contactless determination of the electrical sheet resistance of semiconductor layers with the eddy-current method

€34.30

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DIN 50438-1:1995-07

DIN 50438-1:1995-07

Withdrawn Most Recent

Testing of materials for semiconductor technology - Determination of impurity content in silicon by infrared absorption - Part 1: Oxygen

€56.17

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DIN 50447:1994-04

DIN 50447:1994-04

Superseded Historical

Testing of materials for semiconductor technology; contactless determination of the electrical sheet resistance of semiconductor layers with the eddy-current method

€34.30

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DIN 50440-1:1994-04

DIN 50440-1:1994-04

Superseded Historical

Testing of materials for semiconductor technology; measurement of carrier lifetime in silicon single crystals; recombination carrier lifetime at low injection by photo conductive decay method

€48.79

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DIN 50443-2:1994-06

DIN 50443-2:1994-06

Withdrawn Most Recent

Testing of materials for semiconductor technology; recognition of defects and inhomogeneities in semiconductor single crystals by X-ray topography; III-V-semiconductor compounds

€48.79

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DIN 50441-1:1994-12

DIN 50441-1:1994-12

Superseded Historical

Testing of materials for semiconductor technology - Determination of the geometric dimensions of semiconductor wafers - Part 1: Thickness and thickness variation

€34.30

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DIN 50438-1:1994-09

DIN 50438-1:1994-09

Superseded Historical

Testing of materials for semiconductor technology - Determination of impurity content in silicon by infrared absorption - Part 1: Oxygen

€56.17

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DIN 50451-3:1994-10

DIN 50451-3:1994-10

Superseded Historical

Testing of materials for semiconductor technology - Determination of traces of metals in liquids - Part 3: Al, Co, Cu, Na, Ni and Zn in nitric acid with ICP-MS

€34.30

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DIN 50454-2:1994-10

DIN 50454-2:1994-10

Withdrawn Most Recent

Testing of materials for semiconductor technology - Determination of the dislocation etch pits density in monocrystals of III-V-compound semiconductors - Part 2: Indium phosphide

€34.30

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