Standard Test Methods for Measuring Resistivity and Hall Coefficient and Determining Hall Mobility in Single-Crystal Semiconductors (Withdrawn 2023)
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Standard Specification for Iron-Nickel Sealing Alloys (Withdrawn 2024)
Standard Test Method for Measuring the Force-Resistance of a Membrane Force Sensor (Withdrawn 2023)
Standard Guide for Handling and Application of a Membrane Switch or Printed Electronic Device to its Final Support Structure (Withdrawn 2023)
Standard Specification for Nickel Strip for Electron Tubes (Withdrawn 2008)
Standard Practice for Creasing or Bending a Membrane Switch, Membrane Switch Flex Tail Assembly or Membrane Switch Component (Withdrawn 2018)
Standard Test Method for Determining the Abrasion Resistance of Inks and Coatings on Membrane Switches Using the Norman Tool "RCA" Abrader (Withdrawn 2017)
Standard Specification for Refractory Silicide Sputtering Targets for Microelectronic Applications (Withdrawn 2020)
Standard Specification for Chromium Sputtering Targets for Thin Film Applications (Withdrawn 2020)
Standard Practice for Ultrasonic C-Scan Bond Evaluation of Sputtering Target-Backing Plate Assemblies (Withdrawn 2020)
Standard Specification for Pure Aluminum (Unalloyed) Source Material for Electronic Thin Film Applications (Withdrawn 2020)
Standard Specification for Pure Aluminum (Unalloyed) Source Material for Vacuum Coating Applications (Withdrawn 2020)
Standard Test Method for Pass Through Flux of Circular Magnetic Sputtering Targets (Withdrawn 2020)
Test Method for Quantifying Tungsten Silicide Semiconductor Process Films for Composition and Thickness (Withdrawn 2020)
Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications (Withdrawn 2020)