F01

ASTM F76-08(2016)e1

ASTM F76-08(2016)e1

Withdrawn Most Recent

Standard Test Methods for Measuring Resistivity and Hall Coefficient and Determining Hall Mobility in Single-Crystal Semiconductors (Withdrawn 2023)

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ASTM F30-96(2017)

ASTM F30-96(2017)

Withdrawn Most Recent

Standard Specification for Iron-Nickel Sealing Alloys (Withdrawn 2024)

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ASTM F3291-17

ASTM F3291-17

Withdrawn Most Recent

Standard Test Method for Measuring the Force-Resistance of a Membrane Force Sensor (Withdrawn 2023)

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ASTM F3290-17

ASTM F3290-17

Withdrawn Most Recent

Standard Guide for Handling and Application of a Membrane Switch or Printed Electronic Device to its Final Support Structure (Withdrawn 2023)

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ASTM F3-02a

ASTM F3-02a

Withdrawn Most Recent

Standard Specification for Nickel Strip for Electron Tubes (Withdrawn 2008)

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ASTM F1683-09

ASTM F1683-09

Withdrawn Most Recent

Standard Practice for Creasing or Bending a Membrane Switch, Membrane Switch Flex Tail Assembly or Membrane Switch Component (Withdrawn 2018)

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ASTM F2357-10

ASTM F2357-10

Withdrawn Most Recent

Standard Test Method for Determining the Abrasion Resistance of Inks and Coatings on Membrane Switches Using the Norman Tool "RCA" Abrader (Withdrawn 2017)

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ASTM F1238-95(2011)

ASTM F1238-95(2011)

Withdrawn Most Recent

Standard Specification for Refractory Silicide Sputtering Targets for Microelectronic Applications (Withdrawn 2020)

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ASTM F1367-98(2011)

ASTM F1367-98(2011)

Withdrawn Most Recent

Standard Specification for Chromium Sputtering Targets for Thin Film Applications (Withdrawn 2020)

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ASTM F1512-94(2011)

ASTM F1512-94(2011)

Withdrawn Most Recent

Standard Practice for Ultrasonic C-Scan Bond Evaluation of Sputtering Target-Backing Plate Assemblies (Withdrawn 2020)

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ASTM F1513-99(2011)

ASTM F1513-99(2011)

Withdrawn Most Recent

Standard Specification for Pure Aluminum (Unalloyed) Source Material for Electronic Thin Film Applications (Withdrawn 2020)

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ASTM F1594-95(2011)

ASTM F1594-95(2011)

Withdrawn Most Recent

Standard Specification for Pure Aluminum (Unalloyed) Source Material for Vacuum Coating Applications (Withdrawn 2020)

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ASTM F1761-00(2011)

ASTM F1761-00(2011)

Withdrawn Most Recent

Standard Test Method for Pass Through Flux of Circular Magnetic Sputtering Targets (Withdrawn 2020)

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ASTM F1894-98(2011)

ASTM F1894-98(2011)

Withdrawn Most Recent

Test Method for Quantifying Tungsten Silicide Semiconductor Process Films for Composition and Thickness (Withdrawn 2020)

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ASTM F2113-01(2011)

ASTM F2113-01(2011)

Withdrawn Most Recent

Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications (Withdrawn 2020)

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