Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications (Withdrawn 2023)
This product is not for sale, please contact us for more information
Standard Test Method for Trace Metallic Impurities in Electronic Grade Titanium by High Mass-Resolution Glow Discharge Mass Spectrometer (Withdrawn 2023)
Standard Practice for Measuring Sheet Resistance of Thin Film Conductors For Flat Panel Display Manufacturing Using a Noncontact Eddy Current Gage (Withdrawn 2023)
Standard Test Method for Trace Metallic Impurities in Electronic Grade Aluminum-Copper, Aluminum-Silicon, and Aluminum-Copper-Silicon Alloys by High-Mass-Resolution Glow Discharge Mass Spectrometer (Withdrawn 2023)
Standard Test Method for Determining the Luminance Curve of an Electroluminescent Lamp at Ambient Conditions (Withdrawn 2023)
Test Method for Determining the Electrical Resistivity of a Printed Conductive Material (Withdrawn 2023)
Standard Test Method for Verifying the Specified Dielectric Withstand Voltage and Determining the Dielectric Breakdown Voltage of a Membrane Switch or Printed Electronic Device (Withdrawn 2023)
Standard Test Method for Measuring the Force-Displacement of a Membrane Switch (Withdrawn 2023)
Standard Test Method for Determining the Effects of Bending a Membrane Switch or Printed Electronic Device (Withdrawn 2023)
Standard Test Method for Determining Abrasion Resistance of Inks and Coatings on Substrates Using Dry or Wet Abrasive Medium (Withdrawn 2023)
Standard Test Method for Measuring Dose Rate Threshold for Upset of Digital Integrated Circuits (Metric) (Withdrawn 2023)
Standard Practice for Measuring Sheet Resistance of Thin Film Conductors for Flat Panel Display Manufacturing Using a Four-Point Probe Method (Withdrawn 2023)
Standard Practice for Measuring Dose Rate Response of Linear Integrated Circuits (Metric) (Withdrawn 2023)
Standard Specification for High-Purity Titanium Sputtering Target Used for Through-Silicon Vias (TSV) Metallization (Withdrawn 2023)
Standard Specification for High-Purity Copper Sputtering Target Used for Through-Silicon Vias (TSV) Mettalization (Withdrawn 2023)