E42

ASTM E1504-92(1996) (R1992)

ASTM E1504-92(1996) (R1992)

Superseded Historical

Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)

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ASTM E1438-91(1996) (R1991)

ASTM E1438-91(1996) (R1991)

Superseded Historical

Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS

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ASTM E1829-97

ASTM E1829-97

Superseded Historical

Standard Guide for Handling Specimens Prior to Surface Analysis

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ASTM E827-95

ASTM E827-95

Superseded Historical

Standard Practice for Indentifying Elements by the Peaks in Auger Electron Spectroscopy

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ASTM E1505-92(1996) (R1992)

ASTM E1505-92(1996) (R1992)

Superseded Historical

Standard Guide for Determining SIMS Relative Sensitivity Factors from Ion Implanted External Standards

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ASTM E1162-87(1996) (R1987)

ASTM E1162-87(1996) (R1987)

Superseded Historical

Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)

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ASTM E1127-03

ASTM E1127-03

Superseded Historical

Standard Guide for Depth Profiling in Auger Electron Spectroscopy

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ASTM E1635-06(2011)

ASTM E1635-06(2011)

Superseded Historical

Standard Practice for Reporting Imaging Data in Secondary Ion Mass Spectrometry (SIMS)

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ASTM E1880-12

ASTM E1880-12

Superseded Historical

Standard Practice for Tissue Cryosection Analysis with SIMS

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ASTM E1881-12

ASTM E1881-12

Superseded Historical

Standard Guide for Cell Culture Analysis with SIMS

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ASTM E673-02a

ASTM E673-02a

Superseded Historical

Standard Terminology Relating to Surface Analysis

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ASTM E673-02b

ASTM E673-02b

Superseded Historical

Standard Terminology Relating to Surface Analysis

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ASTM E1577-04

ASTM E1577-04

Superseded Historical

Standard Guide for Reporting of Ion Beam Parameters Used in Surface Analysis

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ASTM E996-04

ASTM E996-04

Superseded Historical

Standard Practice for Reporting Data in Auger Electron Spectroscopy and X-ray Photoelectron Spectroscopy

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ASTM E1636-04

ASTM E1636-04

Superseded Historical

Standard Practice for Analytically Describing Sputter-Depth-Profile Interface Data by an Extended Logistic Function

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