29.045 : Semiconducting materials

ASTM F1188-00

ASTM F1188-00

Superseded Historical

Standard Test Method for Interstitial Atomic Oxygen Content of Silicon by Infrared Absorption

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ASTM F1212-89(2002) (R1989)

ASTM F1212-89(2002) (R1989)

Withdrawn Most Recent

Standard Test Method for Thermal Stability Testing of Gallium Arsenide Wafers (Withdrawn 2008)

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ASTM F1239-02

ASTM F1239-02

Withdrawn Most Recent

Standard Test Methods for Oxygen Precipitation Characterization of Silicon Wafers by Measurement of Interstitial Oxygen Reduction (Withdrawn 2003)

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ASTM F1241-95(2000)

ASTM F1241-95(2000)

Withdrawn Most Recent

Standard Terminology of Silicon Technology (Withdrawn 2003)

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ASTM F121-83

ASTM F121-83

Superseded Historical

Test Method for Interstitial Atomic Oxygen Content of Silicon by Infrared Absorption

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ASTM F122-74(1985)

ASTM F122-74(1985)

Withdrawn Most Recent

Test Method for Interstitial Atomic Oxygen Content of Silicon by Infrared Absorption (Withdrawn 1990)

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ASTM F123-91

ASTM F123-91

Withdrawn Most Recent

Test Method for Substitutional Atomic Carbon Content of Silicon by Infrared Absorption (Withdrawn 1992)

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ASTM F388-84

ASTM F388-84

Withdrawn Most Recent

Method for Measurement of Oxide Thickness on Silicon Wafers and Metallization Thickness by Multiple-Beam Interference (Tolansky Method) (Withdrawn 1993)

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ASTM F612-88

ASTM F612-88

Withdrawn Most Recent

Practice for Cleaning Surfaces of Polished Silicon Slices (Withdrawn 1993)

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ASTM F775-88

ASTM F775-88

Withdrawn Most Recent

Test Method for Wafer and Slice Flatness by Interferometric (Withdrawn 1991)

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ASTM F848-83(1988)

ASTM F848-83(1988)

Withdrawn Most Recent

Method for Determining the Lattice Constant of Single Crystal Gadolinium Gallium Garnet (Withdrawn 1992)

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ASTM F849-83(1988)

ASTM F849-83(1988)

Withdrawn Most Recent

Method for Identification and Test of Structures and Contaminants Seen on Polished Gadolinium Gallium Surfaces (Withdrawn 1992)

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ASTM F850-83(1988)

ASTM F850-83(1988)

Withdrawn Most Recent

Test Method for Crystallographic Perfection of Gadolinium Gallium Garnet by Preferential Etch Techniques (Withdrawn 1992)

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ASTM F1189-88

ASTM F1189-88

Withdrawn Most Recent

Test Method for Using Computer-Assisted Infrared Spectrophotometry to Measure the Interstitial Oxygen Content of Silicon Slices Polished on Both Sides (Withdrawn 1993)

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ASTM F1894-98

ASTM F1894-98

Superseded Historical

Test Method for Quantifying Tungsten Silicide Semiconductor Process Films for Composition and Thickness

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