29.045 : Semiconducting materials

ASTM F576-01

ASTM F576-01

Withdrawn Most Recent

Standard Test Method for Measurement of Insulator Thickness and Refractive Index on Silicon Substrates by Ellipsometry (Withdrawn 2003)

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ASTM F615M-95

ASTM F615M-95

Superseded Historical

Standard Practice for Determining Safe Current Pulse-Operating Regions for Metallization on Semiconductor Components [Metric]

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ASTM F657-92(1999)

ASTM F657-92(1999)

Withdrawn Most Recent

Standard Test Method for Measuring Warp and Total Thickness Variation on Silicon Wafers by Noncontact Scanning (Withdrawn 2003)

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ASTM F671-99

ASTM F671-99

Withdrawn Most Recent

Standard Test Method for Measuring Flat Length on Wafers of Silicon and Other Electronic Materials (Withdrawn 2003)

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ASTM F672-01

ASTM F672-01

Withdrawn Most Recent

Standard Test Method for Measuring Resistivity Profiles Perpendicular to the Surface of a Silicon Wafer Using a Spreading Resistance Probe (Withdrawn 2003)

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ASTM F673-90(1996)e1

ASTM F673-90(1996)e1

Superseded Historical

Standard Test Methods for Measuring Resistivity of Semiconductor Slices or Sheet Resistance of Semiconductor Films with a Noncontact Eddy-Current Gage

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ASTM F674-92(1999)

ASTM F674-92(1999)

Withdrawn Most Recent

Standard Practice for Preparing Silicon for Spreading Resistance Measurements (Withdrawn 2003)

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ASTM F723-99

ASTM F723-99

Withdrawn Most Recent

Standard Practice for Conversion Between Resistivity and Dopant Density for Boron-Doped, Phosphorus-Doped, and Arsenic-Doped Silicon (Withdrawn 2003)

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ASTM F847-94(1999)

ASTM F847-94(1999)

Superseded Historical

Standard Test Methods for Measuring Crystallographic Orientation of Flats on Single Crystal Silicon Wafers by X-Ray Techniques

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ASTM F928-02

ASTM F928-02

Withdrawn Most Recent

Standard Test Methods for Edge Contour of Circular Semiconductor Wafers and Rigid Disk Substrates (Withdrawn 2003)

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ASTM F950-98

ASTM F950-98

Superseded Historical

Standard Test Method for Measuring the Depth of Crystal Damage of a Mechanically Worked Silicon Slice Surface by Angle Polishing and Defect Etching

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ASTM F951-02

ASTM F951-02

Withdrawn Most Recent

Standard Test Method for Determination of Radial Interstitial Oxygen Variation in Silicon Wafers (Withdrawn 2003)

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ASTM F978-02

ASTM F978-02

Withdrawn Most Recent

Standard Test Method for Characterizing Semiconductor Deep Levels by Transient Capacitance Techniques (Withdrawn 2003)

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ASTM F1049-00

ASTM F1049-00

Superseded Historical

Standard Practice for Shallow Etch Pit Detection on Silicon Wafers

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ASTM F1152-02

ASTM F1152-02

Withdrawn Most Recent

Standard Test Method for Dimensions of Notches on Silicon Wafers (Withdrawn 2003)

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