29.045 : Semiconducting materials

ASTM F1809-97

ASTM F1809-97

Superseded Historical

Standard Guide for Selection and Use of Etching Solutions to Delineate Structural Defects in Silicon

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ASTM F1982-99e1

ASTM F1982-99e1

Withdrawn Most Recent

Standard Test Methods for Analyzing Organic Contaminants on Silicon Wafer Surfaces by Thermal Desorption Gas Chromatography (Withdrawn 2003)

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ASTM F2074-00

ASTM F2074-00

Withdrawn Most Recent

Standard Guide for Measuring Diameter of Silicon and Other Semiconductor Wafers (Withdrawn 2003)

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ASTM F2113-01e1

ASTM F2113-01e1

Superseded Historical

Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications

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ASTM D6095-12(2018)

ASTM D6095-12(2018)

Superseded Historical

Standard Test Method for Longitudinal Measurement of Volume Resistivity for Extruded Crosslinked and Thermoplastic Semiconducting Conductor and Insulation Shielding Materials

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ASTM F980-16

ASTM F980-16

Superseded Historical

Standard Guide for Measurement of Rapid Annealing of Neutron-Induced Displacement Damage in Silicon Semiconductor Devices

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DIN 50450-2:2026-03

DIN 50450-2:2026-03

Active Most Recent

Testing of materials for semiconductor technology - Determination of impurities in carrier gases and dopant gases - Part 2: Determination of Oxygen impurities in Nitrogen, Argon, Helium, Neon and Hydrogen using a galvanic cell

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ASTM D3004-02

ASTM D3004-02

Superseded Historical

Standard Specification for Extruded Crosslinked and Thermoplastic Semi-Conducting, Conductor and Insulation Shielding Materials

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DIN 50451-1:2002-01

DIN 50451-1:2002-01

Superseded Historical

Testing of materials for semiconductor technology - Determination of traces of metals in liquids - Part 1: Silver (Ag), Gold (Au), copper (Cu), iron (Fe), potassium (K) and sodium (Na) in nitric acid by AAS

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DIN 50451-2:2002-01

DIN 50451-2:2002-01

Superseded Historical

Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 2: Calcium (Ca), Cobolt (Co), chromium (Cr), copper (Cu), iron (Fe), nickel (Ni) and zinc (Zn) in hydrofluoric acid with plasma-induced emission spectroscopy

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DIN 50451-3:2002-01

DIN 50451-3:2002-01

Superseded Historical

Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 3: Aluminium (Al), cobalt (Co), copper (Cu), sodium (Na), nickel (Ni), and zinc (Zn) in nitric acid with ICP-MS

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ASTM F1618-02

ASTM F1618-02

Withdrawn Most Recent

Standard Practice for Determination of Uniformity of Thin Films on Silicon Wafers (Withdrawn 2003)

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ASTM F1527-02

ASTM F1527-02

Withdrawn Most Recent

Standard Guide for Application of Certified Reference Materials and Reference Wafers for Calibration and Control of Instruments for Measuring Resistivity of Silicon (Withdrawn 2003)

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ASTM D3004-97

ASTM D3004-97

Superseded Historical

Standard Specification for Extruded Crosslinked and Thermoplastic Semi-Conducting, Conductor and Insulation Shielding Materials

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ASTM F533-96

ASTM F533-96

Superseded Historical

Standard Test Method for Thickness and Thickness Variation of Silicon Wafers

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