F01

ASTM F632-90

ASTM F632-90

Withdrawn Most Recent

Test Method for Measuring Small-Signal Comon Emitter Current Gain of Transistors at High Frequencies (Withdrawn 1995)

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ASTM F466-79(1992)

ASTM F466-79(1992)

Withdrawn Most Recent

Test Method for Small-Signal Scattering Parameters of Low-Power Transistors in the 0.2 to 2.0 GHZ Frequency Range (Withdrawn 1997)

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ASTM F804-83(1990)E01

ASTM F804-83(1990)E01

Withdrawn Most Recent

Practice for Producing Spin Coating Resist Thickness Curves (Withdrawn 1997)

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ASTM F769-00

ASTM F769-00

Withdrawn Most Recent

Standard Test Method for Measuring Transistor and Diode Leakage Currents (Withdrawn 2006)

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ASTM F1844-97

ASTM F1844-97

Superseded Historical

Standard Practice for Measuring Sheet Resistance of Thin Film Conductors For Flat Panel Display Manufacturing Using a Noncontact Eddy Current Gage

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ASTM F1893-98

ASTM F1893-98

Superseded Historical

Guide for Measurement of Ionizing Dose-Rate Burnout of Semiconductor Devices

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ASTM F1894-98

ASTM F1894-98

Superseded Historical

Test Method for Quantifying Tungsten Silicide Semiconductor Process Films for Composition and Thickness

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ASTM F1842-97

ASTM F1842-97

Superseded Historical

Standard Test Method for Determining Ink or Coating Adhesion on Plastic Substrates for Membrane Switch Applications

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ASTM F1895-98

ASTM F1895-98

Superseded Historical

Practice for Submersion of a Membrane Switch

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ASTM F1896-98

ASTM F1896-98

Superseded Historical

Test Method for Determining the Electrical Resistivity of a Printed Conductive Material

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ASTM F1892-98

ASTM F1892-98

Superseded Historical

Standard Guide for Ionizing Radiation (Total Dose) Effects Testing of Semiconductor Devices

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ASTM F448-99

ASTM F448-99

Superseded Historical

Test Method for Measuring Steady-State Primary Photocurrent

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ASTM F1725-97

ASTM F1725-97

Superseded Historical

Standard Guide for Analysis of Crystallographic Perfection of Silicon Ingots

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ASTM F1726-97

ASTM F1726-97

Superseded Historical

Standard Guide for Analyis of Crystallographic Perfection of Silicon Wafers

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ASTM F1727-97

ASTM F1727-97

Superseded Historical

Standard Practice for Detection of Oxidation Induced Defects in Polished Silicon Wafers

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