F01

ASTM F1190-99

ASTM F1190-99

Superseded Historical

Standard Guide for Neutron Irradiation of Unbiased Electronic Components

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ASTM F1192-00

ASTM F1192-00

Superseded Historical

Standard Guide for the Measurement of Single Event Phenomena (SEP) Induced by Heavy Ion Irradiation of Semiconductor Devices

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ASTM F1211-89(2001)

ASTM F1211-89(2001)

Withdrawn Most Recent

Standard Specification for Semiconductor Device Passivation Opening Layouts (Withdrawn 2007)

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ASTM F1212-89(2002) (R1989)

ASTM F1212-89(2002) (R1989)

Withdrawn Most Recent

Standard Test Method for Thermal Stability Testing of Gallium Arsenide Wafers (Withdrawn 2008)

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ASTM F1226-89(1994)e1

ASTM F1226-89(1994)e1

Withdrawn Most Recent

Standard Test Method for Calibration of Liquid-Borne Particle Counters for Submicrometer Particle Sizing (Withdrawn 2002)

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ASTM F1228-89(1994)E01

ASTM F1228-89(1994)E01

Withdrawn Most Recent

Test Method for Oxidizable (Organic) Carbon on Wafer Surfaces (By Persulfate) (Withdrawn 2001)

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ASTM F1238-95(1999)

ASTM F1238-95(1999)

Superseded Historical

Standard Specification for Refractory Silicide Sputtering Targets for Microelectronic Applications

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ASTM F1239-02

ASTM F1239-02

Withdrawn Most Recent

Standard Test Methods for Oxygen Precipitation Characterization of Silicon Wafers by Measurement of Interstitial Oxygen Reduction (Withdrawn 2003)

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ASTM F1241-95(2000)

ASTM F1241-95(2000)

Withdrawn Most Recent

Standard Terminology of Silicon Technology (Withdrawn 2003)

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ASTM F1261M-96

ASTM F1261M-96

Superseded Historical

Standard Test Method for Determining the Average Electrical Width of a Straight, Thin-Film Metal Line [Metric]

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ASTM F1263-99

ASTM F1263-99

Superseded Historical

Standard Guide for Analysis of Overtest Data in Radiation Testing of Electronic Parts

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ASTM F1269-89(2001)

ASTM F1269-89(2001)

Superseded Historical

Test Methods for Destructive Shear Testing of Ball Bonds

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ASTM F239-81(1987)

ASTM F239-81(1987)

Withdrawn Most Recent

Specification for Nickel Alloy Cathode Sleeves for Electron Devices (Withdrawn 1992)

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ASTM F324-75(1980)

ASTM F324-75(1980)

Withdrawn Most Recent

Test Method for Nonvolatile Residue of Volatile Cleaning Solvents Using the Solvent Purity Meter (Withdrawn 1987)

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ASTM F388-84

ASTM F388-84

Withdrawn Most Recent

Method for Measurement of Oxide Thickness on Silicon Wafers and Metallization Thickness by Multiple-Beam Interference (Tolansky Method) (Withdrawn 1993)

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