F01

ASTM F1404-92(1999)

ASTM F1404-92(1999)

Superseded Historical

Test Method for Crystallographic Perfection of Gallium Arsenide by Molten Potassium Hydroxide (KOH) Etch Technique

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ASTM F1438-93(1999)

ASTM F1438-93(1999)

Superseded Historical

Standard Test Method for Determination of Surface Roughness by Scanning Tunneling Microscopy for Gas Distribution System Components

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ASTM F1451-92(1999)

ASTM F1451-92(1999)

Withdrawn Most Recent

Standard Test Method for Measuring Sori on Silicon Wafers by Automated Noncontact Scanning (Withdrawn 2003)

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ASTM F1466-99

ASTM F1466-99

Superseded Historical

Standard Specification for Iron-Nickel-Cobalt Alloys for Metal-to-Ceramic Sealing Applications

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ASTM F1467-99

ASTM F1467-99

Superseded Historical

Standard Guide for Use of an X-Ray Tester ([approximate]10 keV Photons) in Ionizing Radiation Effects Testing of Semiconductor Devices and Microcircuits

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ASTM F1512-94(1999)

ASTM F1512-94(1999)

Superseded Historical

Standard Practice for Ultrasonic C-Scan Bond Evaluation of Sputtering Target-Backing Plate Assemblies

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ASTM F1513-99

ASTM F1513-99

Superseded Historical

Standard Specification for Pure Aluminum (Unalloyed) Source Material for Electronic Thin Film Applications

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ASTM F1526-95(2000)

ASTM F1526-95(2000)

Withdrawn Most Recent

Standard Test Method for Measuring Surface Metal Contamination on Silicon Wafers by Total Reflection X-Ray Fluorescence Spectroscopy (Withdrawn 2003)

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ASTM F1527-00

ASTM F1527-00

Superseded Historical

Standard Guide for Application of Silicon Standard Reference Materials and Reference Wafers for Calibration and Control of Instruments for Measuring Resistivity of Silicon

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ASTM F1528-94(1999)

ASTM F1528-94(1999)

Withdrawn Most Recent

Standard Test Method for Measuring Boron Contamination in Heavily Doped N-Type Silicon Substrates by Secondary Ion Mass Spectrometry (Withdrawn 2003)

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ASTM F1529-97

ASTM F1529-97

Withdrawn Most Recent

Standard Test Method for Sheet Resistance Uniformity Evaluation by In-Line Four-Point Probe with the Dual-Configuration Procedure (Withdrawn 2003)

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ASTM F1530-94

ASTM F1530-94

Superseded Historical

Standard Test Method for Measuring Flatness, Thickness, and Thickness Variation on Silicon Wafers by Automated Noncontact Scanning

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ASTM F1535-00

ASTM F1535-00

Withdrawn Most Recent

Standard Test Method for Carrier Recombination Lifetime in Silicon Wafers by Noncontact Measurement of Photoconductivity Decay by Microwave Reflectance (Withdrawn 2003)

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ASTM F1569-94(1999)

ASTM F1569-94(1999)

Withdrawn Most Recent

Standard Guide for Generation of Consensus Reference Materials for Semiconductor Technology (Withdrawn 2003)

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ASTM F1570-01e1

ASTM F1570-01e1

Withdrawn Most Recent

Standard Test Method for Determining the Tactile Ratio of a Membrane Switch (Withdrawn 2007)

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