F01

ASTM F2114-02

ASTM F2114-02

Withdrawn Most Recent

Standard Guide for ASTM Standard Test Methods, Standard Practices, and Typical Values of a Membrane Switch (Withdrawn 2009)

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ASTM F673-02

ASTM F673-02

Withdrawn Most Recent

Standard Test Methods for Measuring Resistivity of Semiconductor Slices or Sheet Resistance of Semiconductor Films with a Noncontact Eddy-Current Gage (Withdrawn 2003)

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ASTM F1392-02

ASTM F1392-02

Withdrawn Most Recent

Standard Test Method for Determining Net Carrier Density Profiles in Silicon Wafers by Capacitance-Voltage Measurements With a Mercury Probe (Withdrawn 2003)

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ASTM E1392-96(2002) (R1996)

ASTM E1392-96(2002) (R1996)

Withdrawn Most Recent

Standard Practice for Angle Resolved Optical Scatter Measurements on Specular or Diffuse Surfaces (Withdrawn 2003)

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ASTM F1390-02

ASTM F1390-02

Withdrawn Most Recent

Standard Test Method for Measuring Warp on Silicon Wafers by Automated Noncontact Scanning (Withdrawn 2003)

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ASTM F1811-97(2002) (R1997)

ASTM F1811-97(2002) (R1997)

Withdrawn Most Recent

Standard Practice for Estimating the Power Spectral Density Function and Related Finish Parameters from Surface Profile Data (Withdrawn 2003)

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ASTM F1843-97(2002) (R1997)

ASTM F1843-97(2002) (R1997)

Superseded Historical

Standard Practice for Sample Preparation of Transparent Plastic Films for Specular Gloss Measurements, on Membrane Switch Overlays

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ASTM F398-92(2002) (R1992)

ASTM F398-92(2002) (R1992)

Withdrawn Most Recent

Standard Test Method for Majority Carrier Concentration in Semiconductors by Measurement of Wavenumber or Wavelength of the Plasma Resonance Minimum (Withdrawn 2003)

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ASTM F728-81(2003) (R1981)

ASTM F728-81(2003) (R1981)

Withdrawn Most Recent

Standard Practice for Preparing An Optical Microscope for Dimensional Measurements (Withdrawn 2003)

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ASTM F1153-92(2002) (R1992)

ASTM F1153-92(2002) (R1992)

Withdrawn Most Recent

Standard Test Method for Characterization of Metal-Oxide-Silicon (MOS) Structures by Capacitance-Voltage Measurements (Withdrawn 2003)

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ASTM F1188-02

ASTM F1188-02

Withdrawn Most Recent

Standard Test Method for Interstitial Atomic Oxygen Content of Silicon by Infrared Absorption with Short Baseline (Withdrawn 2003)

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ASTM F1366-92(2002) (R1992)

ASTM F1366-92(2002) (R1992)

Withdrawn Most Recent

Standard Test Method for Measuring Oxygen Concentration in Heavily Doped Silicon Substrates by Secondary Ion Mass Spectrometry (Withdrawn 2003)

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ASTM F1530-02

ASTM F1530-02

Withdrawn Most Recent

Standard Test Method for Measuring Flatness, Thickness, and Thickness Variation on Silicon Wafers by Automated Noncontact Scanning (Withdrawn 2003)

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ASTM F1617-98(2002) (R1998)

ASTM F1617-98(2002) (R1998)

Withdrawn Most Recent

Standard Test Method for Measuring Surface Sodium, Aluminum, Potassium, and Iron on Silicon and EPI Substrates by Secondary Ion Mass Spectrometry (Withdrawn 2003)

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ASTM F1763-96(2002) (R1996)

ASTM F1763-96(2002) (R1996)

Withdrawn Most Recent

Standard Test Methods for Measuring Contrast of a Linear Polarizer (Withdrawn 2003)

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