Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials
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Surface chemical analysis — Glow discharge optical emission spectrometry (GD-OES) — Introduction to use
Surface chemical analysis — Determination of lateral resolution and sharpness in beam based methods with a range from nanometres to micrometres
Gas analysis — Sampling guidelines
Gas analysis — Comparison methods for the determination of the composition of gas mixtures based on one- and two-point calibration
Surface chemical analysis — Auger electron spectroscopy — Derivation of chemical information
Surface chemical analysis — Secondary-ion mass spectrometry — Method for depth profiling of boron in silicon
Surface chemical analysis — Secondary ion mass spectrometry — Linearity of intensity scale in single ion counting time-of-flight mass analysers
Surface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
Surface chemical analysis — Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
Surface chemical analysis — Surface characterization — Measurement of the lateral resolution of a confocal fluorescence microscope
Surface chemical analysis — Use of Total Reflection X-ray Fluorescence spectroscopy in biological and environmental analysis
Surface chemical analysis — Electron spectroscopies — Procedures for identifying, estimating and correcting for unintended degradation by X-rays in a material undergoing analysis by X-ray photoelectron spectroscopy
Surface chemical analysis — Scanning-probe microscopy — Definition and calibration of the lateral resolution of a near-field optical microscope
Gas analysis — Conversion of gas mixture composition data Technical Corrigendum 1
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