Nombre | apoyo | Revisión | Disponibilidad | Fecha de emisión | Precio | ||
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PDF sécurisé |
Inglés |
Vigente |
1/12/2019 |
204,00 € |
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Detalles
This Document describes a method for a quantitative analysis for surface trace-metal concentration of critical chamber components (CCCs) by using inductively coupled plasma-mass spectrometry (ICP-MS). This Standard is intended to promote communication between the users and the processing-equipment suppliers. It can be also used to facilitate better communication regarding surface metal-contamination expectation and its test method between the processing equipment suppliers and the CCC manufacturers.
This Document describes the procedure for trace-metal measurement, including the surface trace-metal collection from a CCC, as it influences the reliability of measurement data and reproducibility of each test facility.
The use of this Document is to ensure consistency in the reporting of results provided by each processing-equipment supplier or CCC manufacturer.
This Document applies to the measurement of surface trace-metal concentration of CCCs (e.g., showerheads, pedestals) by ICP-MS.
This Document applies to an unused CCC or its parts.
This Document covers local extraction and full-immersion trace-metal collection techniques.
Información adicional
Autor | Semiconductor Equipment and Materials Institute (SEMI) |
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Publicado por | SEMI |
Tipo de Documento | Norma |