| Nom | Support | Langue | Disponibilité | Date d'édition | Prix | ||
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PDF sécurisé |
Anglais |
Active |
01/11/2013 |
204,00 € |
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Détails
This Test Method enables the determination of step height measurements of thin films. Step height measurements can be used to determine thin film thickness values. Thickness measurements are an aid in the design and fabrication of MEMS devices and can be used to obtain thin film material parameters, such as Young’s modulus.
This Test Method presents a procedure for measuring step heights of thin films using step height test structures. It applies only to films, such as those found in microelectromechanical system (MEMS) materials, which can be accurately imaged using an optical interferometer (also called an interferometric microscope) or comparable instrument with the capability of obtaining topographical 2-D data traces.
Informations supplémentaires
| Auteur | Semiconductor Equipment and Materials Institute (SEMI) |
|---|---|
| Edité par | SEMI |
| Type de document | Norme |
| Date de confirmation | 2019-08-01 |
