| Nom | Support | Langue | Disponibilité | Date d'édition | Prix | ||
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PDF sécurisé |
Anglais |
Active |
01/08/2013 |
204,00 € |
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Détails
The purpose is to provide guidance for reproducible electrostatic measurements on any surface or object, consistent with the scope and limitations set forth below.
The measurement methods described herein can be applied to characterize the general electrostatic charge, voltage, field level(s), and electrostatic discharge (ESD) on objects and surfaces in semiconductor manufacturing environments. Acceptable equipment, calibration, and measurement techniques are described in this Document. Appendices include background information on the equipment specified and calibration procedures, as well as information and advice on performing a useful general electrostatic survey.
Informations supplémentaires
| Auteur | Semiconductor Equipment and Materials Institute (SEMI) |
|---|---|
| Edité par | SEMI |
| Type de document | Norme |
| Date de confirmation | 2019-10-01 |
