Nom | Support | Langue | Disponibilité | Date d'édition | Prix | ||
---|---|---|---|---|---|---|---|
PDF sécurisé |
Anglais |
Active |
01/12/2019 |
204,00 € |
|
Détails
This Document describes a method for a quantitative analysis for surface trace-metal concentration of critical chamber components (CCCs) by using inductively coupled plasma-mass spectrometry (ICP-MS). This Standard is intended to promote communication between the users and the processing-equipment suppliers. It can be also used to facilitate better communication regarding surface metal-contamination expectation and its test method between the processing equipment suppliers and the CCC manufacturers.
This Document describes the procedure for trace-metal measurement, including the surface trace-metal collection from a CCC, as it influences the reliability of measurement data and reproducibility of each test facility.
The use of this Document is to ensure consistency in the reporting of results provided by each processing-equipment supplier or CCC manufacturer.
This Document applies to the measurement of surface trace-metal concentration of CCCs (e.g., showerheads, pedestals) by ICP-MS.
This Document applies to an unused CCC or its parts.
This Document covers local extraction and full-immersion trace-metal collection techniques.
Informations supplémentaires
Auteur | Semiconductor Equipment and Materials Institute (SEMI) |
---|---|
Edité par | SEMI |
Type de document | Norme |