| Nom | Support | Langue | Disponibilité | Date d'édition | Prix | ||
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PDF sécurisé |
Anglais |
Active |
01/06/2019 |
204,00 € |
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Détails
This Standard specifies EUV Pod for the 150 mm Extreme Ultraviolet Lithography (EUVL) reticle, used to ship, transport and store a 6-inch reticle. The EUV Pod consists of an outer pod and a protective inner pod. The EUV Pod is to be used when a conventional reticle carrier does not meet the requirements of EUVL.
This Standard is intended to set an appropriate level of specification that places minimal limits on innovation while ensuring modularity and their interchangeability at all mechanical interfaces. Many requirements given in this Specification are in the form of maximum or minimum dimensions with very few required surfaces. No material requirements or microcontamination limits are given in this Specification.
Because of high attenuation feature of EUV light, a conventional pellicle film cannot be placed in front of EUVL reticles. The inner pod is to protect reticles from particle contamination.
The EUV Pod has the following components and subcomponents. The baseplate of inner pod has two possible configurations depending on the intended usage. They are designated Type A and Type B. Detail configuration requirements for each are shown in Table 2.
Existing specifications for the EUV substrate, blank and reticle are to be followed. Therefore, any requirement specified in this Standard shall not negatively impact performances derived from the specifications in SEMI P37, SEMI P38, and SEMI P40.
Informations supplémentaires
| Auteur | Semiconductor Equipment and Materials Institute (SEMI) |
|---|---|
| Edité par | SEMI |
| Type de document | Norme |
