| Name | Support | Language | Availability | Edition date | Price | ||
|---|---|---|---|---|---|---|---|
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PDF |
English, German |
Active |
9/1/2018 |
€90.75 |
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Details
This standard deals with reflective X-ray optics by employing total external reflection or Bragg reflection on inner interfaces of a multilayer structure to influence the spectral composition and the directional characteristic. The physical basics and important parameters of X-ray optics are described. The role and the influence of substrate and coating are explained in detail. Total external reflection and multilayer mirrors for several applications are discussed. The most common X-ray optical systems using X-ray mirrors such as Kirkpatrick-Baez, Wolter, Schwarzschild, Montel and EUVL optics are briefly introduced. This standard addresses users, developers and producers of X-ray mirrors. Typical application fields are laboratory equipment using X-rays e.g. for diffraction, spectroscopy, scattering, tomography, and microscopy as well as instrumentation for synchrotron radiation at electron storage rings and free-electron-lasers. Further application fields are EUV-lithography and X-ray astrophysics.
Additional Info
| Author | Verein Deutscher Ingenieure (VDI) |
|---|---|
| Published by | VDI |
| Document type | Standard |
| ICS | 17.180.30 : Optical measuring instruments
|
| Number of pages | 19 |
| Replace | VDI/VDE 5575 Blatt 4 (2011-08),VDI/VDE 5575 Blatt 4 (2017-10) |
| Document history | VDI/VDE 5575 Blatt 4 (2018-09),VDI/VDE 5575 Blatt 4 (2017-10),VDI/VDE 5575 Blatt 4 (2011-08),VDI/VDE 5575 Blatt 4 (2009-09) |
| Keyword | VDI 5575,VDI 5575 Blatt 4,VDI/VDE 5575,5575 |
