| Name | Support | Language | Availability | Edition date | Price | ||
|---|---|---|---|---|---|---|---|
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PDF |
English |
Active |
5/26/2021 |
€37.00 |
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Details
This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.
Directives : Not yet available in DB
Additional Info
| Author | Bureau de Normalisation Belge (NBN) |
|---|---|
| Published by | NBN |
| Document type | Standard |
| ICS | 81.060.30 : Advanced ceramics
|
| Document history | No |
| Keyword | ISO 21859, ISO 21859:2021 |
